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Dry Etch and Wet Clean Process Characterization of Ultra Low-k (ULK) Material NanoglassRE

著者名:
掲載資料名:
Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
812
発行年:
2004
開始ページ:
97
終了ページ:
102
総ページ数:
6
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558997622 [1558997628]
言語:
英語
請求記号:
M23500/812
資料種別:
国際会議録

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