Deposition and Integration of a Novel Ultra-Low-k (2.2) Material
- 著者名:
- 掲載資料名:
- Materials, technology and reliability for advanced interconnects and low-k dielectrics - 2004 : symposium held April 13-15, 2004, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 812
- 発行年:
- 2004
- 開始ページ:
- 79
- 終了ページ:
- 84
- 総ページ数:
- 6
- 出版情報:
- Warrendale: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997622 [1558997628]
- 言語:
- 英語
- 請求記号:
- M23500/812
- 資料種別:
- 国際会議録
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