Blank Cover Image

Infrared Absorption Study of HfO2 and HfO2/Si Interface Ranging from 200 cm-1 to 2000 cm-1

著者名:
掲載資料名:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
811
発行年:
2004
開始ページ:
319
終了ページ:
328
総ページ数:
10
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997615 [155899761X]
言語:
英語
請求記号:
M23500/811
資料種別:
国際会議録

類似資料:

1 国際会議録 Far- and Mid-Infrared Absorption Study of HfO2/SiO2/Si System

Toriumi, A., Tomida, K., Shimizu, H., Kita, K., Kyuno, K.

Electrochemical Society
7 国際会議録 Study of Kinetic Behaviors of GeO in GeO2/Ge Stacks

K. Kita, C. Lee, T. Nishimura, K. Nagashio, A. Toriumi

Electrochemical Society
2 国際会議録 Retarded Growth of Sputtered HfO2 Films on Germanium

Kita, Koji, Sasagawa, Masashi, Toyama, Masahiro, Kyuno, Kentaro, Toriumi, Akira

Materials Research Society
8 国際会議録 Molecular Static Simulation of the Effect of Alkaline Metal Impurities on the Bonding of Al Atoms at the Grain Boundaries of Aluminum

Tu, Geng, Itoh, Akira, Kyuno, Kentaro, Yamamoto, Ryoichi

MRS - Materials Research Society
3 国際会議録 Retarded Growth of Sputtered HfO2 Films on Germanium

Kita, Koji, Sasagawa, Masashi, Toyama, Masahiro, Kyuno, Kentaro, Toriumi, Akira

Materials Research Society
9 国際会議録 Semiconducting Properties of Pentacene Thin Films Studied by Complex Impedance, Surface Mobility and Photo-induced Effects Invited Paper

Toriumi, A., Yokoyama, T., Nishimura, T., Yamada, T., Kita, K., Kyuno, K.

Electrochemical Society
4 国際会議録 Doped HfO₂ fur Higher-k Dielectrics

A. Toriumi, K. Kita, K. Tomida, Y. Yamamoto

Electrochemical Society
10 国際会議録 Experimental and First-Principles Studies of the Band Alignment at the HfO2/4H-SiC (0001) Interface

Tanner, C.M., Choi, J.W., Chang, J.P.

Trans Tech Publications
5 国際会議録 Mechanisms of and Solutions to Moisture Absorption of Lanthanum Oxide as High k Gate Dielectric

Y. Zhao, K. Kita, K. Kyuno, A. Toriumi

Electrochemical Society
11 国際会議録 Impact of High Pressure O2 Annealing on Amorphous LaLuO3/Ge MIS Capacitors

T. Tabata, C. Lee, K. Kita, A. Toriumi

Electrochemical Society
6 国際会議録 Theoretical Analysis of Oxygen Diffusion in Monoclinic HfO2

Ikeda, Minoru, Kresse, Georg, Nabatame, Toshihide, Toriumi, Akira

Materials Research Society
12 国際会議録 SURFACE WAVE VELOCITY OF SILVER/CHROMIUM AND GOLD/CHROMIUM SUPERLATTICES

Kaneko, takeo, Ogu, Shinzo, Kyuno, Kentaro, Inoue, Yasushi, Yamamoto, Ryoichi, Yoshihara, Akira

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12