Low Temperature (<150℃) Doping Techniques for Polysilicon TFT's

Low Temperature (<150℃) Doping Techniques for Polysilicon TFT's

著者名:

Hong, W.S.

掲載資料名:

Amorphous and nanocrystalline silicon science and technology - 2004 : symposium held April 13-16, 2004, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

808

発行年:

2004

開始ページ:

685

終了ページ:

690

総ページ数:

6

出版情報:

Warrendale: Materials Research Society

ISSN:

02729172

ISBN:

9781558997585 [155899758X]

言語:

英語

請求記号:

M23500/808

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014450
シリーズID:	PA00000011
会議名:	Symposium on advanced optical processing of materials
回次:	2004
会議開催地:	San Francisco, CA, USA
会議開催年:	2004.04.13-2004.04.16

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