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Growth and Characterization of Poly-SiGe Prepared by Reactive Thermal CVD

著者名:
掲載資料名:
Amorphous and nanocrystalline silicon science and technology - 2004 : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
808
発行年:
2004
開始ページ:
377
終了ページ:
382
総ページ数:
6
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558997585 [155899758X]
言語:
英語
請求記号:
M23500/808
資料種別:
国際会議録

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