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Fabrication and Characterization of a Germanium Quantum-Dot Transistor Formed by Selective Oxidation of SiGe/Si-on-Insulator

著者名:
Liao, W.M.
Lin, S.W.
Tseng, S.S.
Lin, C.K.
Kuo, M.T.
Li, P.W.
さらに 1 件
掲載資料名:
Amorphous and nanocrystalline silicon science and technology - 2004 : symposium held April 13-16, 2004, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
808
発行年:
2004
開始ページ:
11
終了ページ:
16
総ページ数:
6
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558997585 [155899758X]
言語:
英語
請求記号:
M23500/808
資料種別:
国際会議録

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