The Oxide/Nitride Interface: A Study for Gate Dielectrics and Field Passivation
- 著者名:
Gila, B. P. Luo, B. Kim, J. Mehandru, R. LaRoche, J. R. Onstine, A. H. Lambers, E. Siebein, K. Abernathy, C. R. Ren, F. Pearton, S. J. - 掲載資料名:
- Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 786
- 発行年:
- 2004
- 開始ページ:
- 385
- 終了ページ:
- 396
- 総ページ数:
- 12
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997240 [1558997245]
- 言語:
- 英語
- 請求記号:
- M23500/786
- 資料種別:
- 国際会議録
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