On the Interface Quality of MIS Structures Fabricated From Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5-Ta2O5-Nb2O5 Dielectric Thin Films

On the Interface Quality of MIS Structures Fabricated From Atomic Layer Deposition of HfO2, Ta2O5 and Nb2O5-Ta2O5-Nb2O5 Dielectric Thin Films

著者名:

Duenas, S.

掲載資料名:

Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

786

発行年:

2004

開始ページ:

147

終了ページ:

152

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997240 [1558997245]

言語:

英語

請求記号:

M23500/786

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014443
シリーズID:	PA00000011
会議名:	Symposium on fundamentals of novel oxide
回次:	2003
会議開催地:	Boston, MA, USA
会議開催年:	2003.12.01-2003.12.04

類似資料:

1 国際会議録 Electrical Defects in Atomic Layer Deposited HfO2 Films on Silicon: Influence ofPrecursor Chemistries and Substrate Treatment Duenas, S., Castan, H., Garcia, H., Bailon, L., KuKli, K., Ritala, M., Leskela, M. Springer	7 国際会議録 Atomic layer deposition of metal thin films Leskela, M., Aaltonen, T., Hamalainen, J., Niskanen, A., Ritala, M. Electrochemical Society
2 国際会議録 Disordered Structure and Density of Gap States in High-Permittivity Thin SolidFilms Kukli, K., Duenas, S, Garcia, H, Barbolla, J, Aarik, J., Ritala, M, Leskela, M Springer	8 国際会議録 Fabrication of Ta2O5 Thin Films by Anodic Oxidation of Tantalum Nitride and Tantalum Silicide: Growing Mechanisms, Electrical Characterization and ULSI M-I-M … Duenas, S., Castan, H., Barbolla, J., Kola, R. R., Sullivan, P. A. MRS - Materials Research Society
3 国際会議録 Atomic Layer Deposition of Thin Films for Microelectronics Ritala, M., Leskela, M. Electrochemical Society	9 国際会議録 Conductance Transient Comparative Analysis of ECR-PECVD Deposited SiNx, SiO2/SiNx and SiOxNy Dielectric Films on Silicon Substrates Castan, H., Duenas, S., Barbolla, J., Del Prado, A., San Andres, E., Martil, I., Gonzalez-Diaz, G. Materials Research Society
4 国際会議録 Atomic layer deposition of dielectric Nb2O5 films using the NbI5-O2 precursor combination Rooth, M., Kukli, K., Harsta, A. Electrochemical Society	10 国際会議録 Solid Solution CdxZn1-xS Thin Films Grown by Atomic Layer Epitaxy and Successive Ionic Layer Adsorption and Reaction Techniques Valkonen,M.P., Ritala,M., Lindroos,S., Leskela,M. Trans Tech Publications
5 国際会議録 Dielectric Oxide Nanolaminates Deposited by Atomic Layer Epitaxy Kukli, K., Ritala, M., Leskela, M. Electrochemical Society	11 国際会議録 Atomic Layer Deposited Protective Layers M. Leskela, E. Salmi, M. Ritala Trans Tech Publications
6 国際会議録 Atomic Layer Deposition of Metal Oxide Films by using Metal Alkoxides as an Oxygen Source Raeisaenen, P.I., Kukli, K., Rahtu, A., Ritala, M., Leskela, M. Electrochemical Society	12 国際会議録 Atomic Layer Deposited Protective Layers M. Leskela, E. Salmi, M. Ritala Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12