Characterization of High-k Dielectrics by Combined Spectroscopic Ellipsometry (SE) and X-Ray Reflectometry (XRR)
- 著者名:
Sun, L. Defranoux, C. Stehle, J. L. Boher, P. Evrard, P. Bellandi, E. Bender, H. - 掲載資料名:
- Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 786
- 発行年:
- 2004
- 開始ページ:
- 95
- 終了ページ:
- 102
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997240 [1558997245]
- 言語:
- 英語
- 請求記号:
- M23500/786
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering | |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |