High Remanent Polarization in Laser Ablated SrBi2Nb2O9 Thin Films

High Remanent Polarization in Laser Ablated SrBi2Nb2O9 Thin Films

著者名:

掲載資料名:

Advanced optical processing of materials : sympoisum held April 22-23, 2003, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

780

発行年:

2003

開始ページ:

33

終了ページ:

38

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997172 [1558997172]

言語:

英語

請求記号:

M23500/780

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014438
シリーズID:	PA00000011
会議名:	Symposium on multiscale phenomena in materials
回次:	2003
会議開催地:	San Francisco, CA, USA
会議開催年:	2003.04.22-2003.04.23

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