Liberation of Ion Implanted Ge Nanocrystals From a Silicon Dioxide Matrix via Hydrofluoric Acid Vapor Etching
- 著者名:
Sharp, I. D. Xu, Q. Liao, C. Y. Ager III, J. W. Beeman, J. W. Yu, K. M. Zakharov, D. Lilienta-Weber, Z. Haller, E. E. - 掲載資料名:
- Nanostructuring materials with energetic beams : symposium held April 22-23, 2003, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 777
- 発行年:
- 2003
- 開始ページ:
- 33
- 終了ページ:
- 40
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997141 [1558997148]
- 言語:
- 英語
- 請求記号:
- M23500/777
- 資料種別:
- 国際会議録
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12
国際会議録
ION BEAM ETCHING OF SILICON: IMPLANTATION AND DIFFUSION OF NOBLE GAS ATOMS, AND GETTERING OF COPPER
Materials Research Society |