A New Pathway for Si Nanocrystal Formation: Oxi-Reduction Induced by Impurity Implantation

A New Pathway for Si Nanocrystal Formation: Oxi-Reduction Induced by Impurity Implantation

著者名:

Jacobsohu, L. G.

掲載資料名:

Nanostructuring materials with energetic beams : symposium held April 22-23, 2003, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

777

発行年:

2003

開始ページ:

9

終了ページ:

14

総ページ数:

6

出版情報:

Warrendale, Pa.: Materials Research Society

ISSN:

02729172

ISBN:

9781558997141 [1558997148]

言語:

英語

請求記号:

M23500/777

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014435
シリーズID:	PA00000011
会議名:	Symposium on unconventional approaches to nanostructures with applications in electronics, photonics, information storage and sensing
回次:	2003
会議開催地:	San Francisco, CA, USA
会議開催年:	2003.04.22-2003.04.23

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