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Diffusion of Boron in Germanium and Si1-xGex (x＞50%) Alloys

著者名:
Uppal, Suresh
Willoughby, A. F. W.
Bonara, J. M.
Cowernb, N. E. B.
Morrisc, R. J. H.
Bollanid, M.
さらに 1 件
掲載資料名:
CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
765
発行年:
2003
開始ページ:
217
終了ページ:
222
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558997028 [1558997024]
言語:
英語
請求記号:
M23500/765
資料種別:
国際会議録

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