Flat-Band Voltage Study of Atomic-Layer-Deposited Aluminum-Oxide Subjected to Spike Thermal Annealing
- 著者名:
Mehta, V. R. Fiory, A. T. Ravindra, N. M. Ho, M. Y. Wilk, G. D. Sorsch, T. W. - 掲載資料名:
- CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 765
- 発行年:
- 2003
- 開始ページ:
- 109
- 終了ページ:
- 114
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558997028 [1558997024]
- 言語:
- 英語
- 請求記号:
- M23500/765
- 資料種別:
- 国際会議録
類似資料:
Electrochemical Society |
Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
Materials Research Society |
Trans Tech Publications |
MRS - Materials Research Society |
Electrochemical Society |
Materials Research Society |