Growth of Epitaxial Site-Engineered Bi4Ti3O12-Based Thin Films by MOCVD and Their Characterization

Growth of Epitaxial Site-Engineered Bi4Ti3O12-Based Thin Films by MOCVD and Their Characterization

著者名:

Funakubo, Hiroshi

掲載資料名:

Ferroelectric thin films XI : symposium held December 2-5, 2002, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

748

発行年:

2003

開始ページ:

63

終了ページ:

68

総ページ数:

6

出版情報:

Warrendale, Pa: Materials Research Society

ISSN:

02729172

ISBN:

9781558996854 [1558996850]

言語:

英語

請求記号:

M23500/748

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014408
シリーズID:	PA00000011
会議名:	Symposium on ferroelectric thin films
回次:	11th
会議開催地:	Boston, MA, USA
会議開催年:	2002.12.02-2002.12.05

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