Effectiveness of Plasma Nitrided Silicon Oxynitride as a Barrier Layer Between High-k Materials and Si Substrates
- 著者名:
- 掲載資料名:
- Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 745
- 発行年:
- 2003
- 開始ページ:
- 221
- 終了ページ:
- 228
- 総ページ数:
- 8
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996823 [1558996826]
- 言語:
- 英語
- 請求記号:
- M23500/745
- 資料種別:
- 国際会議録
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