Effect of Al-Content and Post Deposition Annealing on the Electrical Properties of Ultra-Thin HfAlxOy Layers
- 著者名:
Carter, R.J. Tsai, W. Young, E. Caymax, M. Maes, J.W. Chen, P.J. Delabie, A. Zhao, C. Gendt, S.De Heyns, M. - 掲載資料名:
- Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 745
- 発行年:
- 2003
- 開始ページ:
- 35
- 終了ページ:
- 40
- 総ページ数:
- 6
- 出版情報:
- Warrendale, Pa.: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558996823 [1558996826]
- 言語:
- 英語
- 請求記号:
- M23500/745
- 資料種別:
- 国際会議録
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