Blank Cover Image

Characterization of Titanium Nitride Thin Films Deposited by Cathodic Arc Plasma Technique onto AISI D6 Tool Steel

著者名:
掲載資料名:
Advanced powder technology IV : proceedings of the 4th International Latin-American Conference on Powder Technology, November 19-21, 2003, Guaruja-Sao Paulo, Brazi
シリーズ名:
Materials science forum
シリーズ巻号:
498-499
発行年:
2005
開始ページ:
717
終了ページ:
721
総ページ数:
5
出版情報:
Zurich-Uetikon, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878499847 [0878499849]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

類似資料:

1 国際会議録 Influence of Zirconia Plasma-Sprayed Coating on Creep of the Ti-6Al-4V Alloy

D. A. P. Reis, C. R. M. da Silva, M. d. C. d. A. Nono, M. J. R. Barboza, F. Piorino Neto, R. A. Vieira

Trans Tech Publications
7 国際会議録 Thin film SOFCs deposited onto porous nickel substrates

Charpentier, P., Fragnaud, P., Schleich, D.M., Lunot, C.

Electrochemical Society
2 国際会議録 A Multi-Technique Study of Titanium Nitride Films Deposited via Reactive Sputter Deposition

Walker, C. G. H., Morton, S. A., Charnock, J. M., MacLean, E. J., Brown, N. M. D.

Trans Tech Publications
8 国際会議録 Cathodic Arc Evaporation of Functionally Graded Chromium Nitride Thin Films for Wear Resistant and Forming Applications

Peters, A. M., Moore, J. J., Reimanis, I., Mishra, B., Weiss, R.

Trans Tech Publications
3 国際会議録 Carbon Nitride Films Using a Filtered Cathodic Arc

Camphausen, Scott M., Tucker, D. A., Bruley, J., Cuomo, J. J.

MRS - Materials Research Society
9 国際会議録 Measurement of Mechanical Properties of Single and Multi-Layered Nitride Thin Films Prepared By Cathodic Arc Deposition

Sikder, A.K., Irfan, I.M., Kumar, Ashok, Durvin, Robert, McDonough, Mark, Smith, M.D.

Materials Research Society
4 国際会議録 CHARACTERIZATION AND PERFORMANCE OF CARBON FILMS DEPOSITED BY PLASMA AND ION BEAM BASED TECHNIQUES

Walter, K. C., Kung, H., Levine, T., Tesmer, J. T., Kodali, P., Wood, B. P., Rej, D. J., Nastasi, M., Koskinen, J., …

MRS - Materials Research Society
10 国際会議録 Characteristics of Silicon Oxy-Nitride Thin Films Deposited by Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition

Valade, L., deCaro, D., Casellas, H., Basso-Bert, M., Faulmann, C., Legros, I-P., Gassoux, P., Aries, L.

Electrochemical Society
5 国際会議録 Characterization of AISI 316L Stainless Steel Pattern via DC Plasma Nitriding

K.C. Kleinjohann, B. Borges Ramos, E.A. Bernardelli, A.M. Maliska

Trans Tech Publications
11 国際会議録 Evaluation of Tribological and Mechanical Properties of Nitride Thin Films Prepared by Cathodic Arc Deposition

Shukla, Pallavi, Sikder, A.K., Kumar, Ashok, Durvin, Robert, McDonough, Mark, Smith, M.D.

Materials Research Society
6 国際会議録 Chemical structure of low-temperature plasma-deposited silicon nitride thin films

Soh, M.T., Savvides, N., Musca, C.A., Dell, J.M., Faraone, L.

SPIE - The International Society of Optical Engineering
12 国際会議録 ECR PLASMA ENHANCED MOCVD OF TITANIUM NITRIDE

Gross, M. E., Weber, A., Nikulski, R., Klages, C. -P., Charatan, R. M., Brown, W. L., Dons, E., Eaglesham, D. J.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12