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Characterization of Cu-Al Alloy/SiO2 Interface Microstructure

著者名:
Wang, Pei-I.
Murarka, S.P.
Yang, G-R.
Barnat, E.
Lu, T-M.
Chen, Y-C.
Li, Xiang
Rajan, K.
さらに 3 件
掲載資料名:
Polycrystalline metal and magnetic thin films-2000 : symposium held April 25-27, 2000, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
615
発行年:
2001
開始ページ:
G7.5/D10.5
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558995239 [1558995234]
言語:
英語
請求記号:
M23500/615
資料種別:
国際会議録

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