Study Of Ta As A Diffusion Barrier In Cu/SiO2 Structure

Study Of Ta As A Diffusion Barrier In Cu/SiO2 Structure

著者名:

掲載資料名:

Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

612

発行年:

2001

開始ページ:

D9.18

出版情報:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558995208 [155899520X]

言語:

英語

請求記号:

M23500/612

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014200
シリーズID:	PA00000011
会議名:	Symposium on materials, technology and reliability for advanced interconnects and low-k dielectrics
回次:	2000
会議開催地:	San Francisco, CA, USA
会議開催年:	2000.04.23-2000.04.27

類似資料:

1 国際会議録 CVD Cu/IMP Cu/TaN/SiO2/Si structures Loh,S.W., Zhang,D.H., Li,C.Y., Liu,R., Wee,A.T.S. SPIE-The International Society for Optical Engineering	7 国際会議録 Study of NiFe/SiO2 Nanocomposites Hui, S., Zhang, Y.D., Xiao, T.D., Wu, Mingzhong, Ge, Shihui, Hines, W.A., Budnick, J.I., Yacaman, M.J., Troiani, H.E. Materials Research Society
2 国際会議録 Effects Of A Thin Flash Copper Layer On The Diffusion Of Cu, Ta, Si, And O In The Cu/TaN/SiO2/Si Structures Loh, S.W., Zhang, D.H., Li, C.Y., Liu, R., Wee, A.T.S., Foo, P.D., Xie, Joseph, Prasad, K., Tan, C.M., Lee, Y.K. Electrochemical Society	8 国際会議録 Effect of ITO carrier concentration on the performance of organic light-emitting diodes Zhu, F., Zhang, K., Huan, C. H. A., Wee, A. T. S., Guenther, E., Jin, C. S. MRS-Materials Research Society
3 国際会議録 Nanostructured Ta-Si-N Thin Films as Diffusion Barriers between Cu and SiO2 Lai, L.W., Chang, C.C., Chen, J.S., Lin, Y.K. Electrochemical Society	9 国際会議録 Low-temperature processing of SiO2 thin films by HD-PECVD technique for gate dielectric applications Joshi, P.C., Moriguchi, M., Crowder, M.A., Droes, S.R.T., Flores, J.S., Voutsas, A.T., Hartzell, J.W. SPIE-The International Society for Optical Engineering
4 国際会議録 Photocatalytic Properties of Mesoporous TiO2 Films Derived from Evaporation-Induced Self-Assembly Method Pan, J.H., Chai, S.Y., Lee, W.I. Trans Tech Publications	10 国際会議録 Effects of Al-C Ion-Implantation and Annealing in Epitaxial 6H-SiC Studied by Structural and Optical Techniques Feng,Z.C., Ferguson,I., Stall,R.A., Li,K., Shi,Y., Singh,H., Tone,K., Zhao,J.H., Wee,A.T.S., Tan,K.L., Adar,F., … Trans Tech Publications
5 国際会議録 Comparison of Amorphous and Crystalline Tantalum Nitrides as Diffusion Barriers in Cu/FSG Structure Chang, C.C., Chen, J.S. Electrochemical Society	11 国際会議録 Characteristics of the Electroless-Deposited Cu Film as Interconnect on a TaN Diffusion Barrier Kim, J.S. Trans Tech Publications
6 国際会議録 Structure Investigations of Several In-Rich (Cu2Se)x(In2Se3)1-x Compositions: From Local Structure to Long Range Order Chang, C.-H., Wei, Su-Huai, Ahrenkiel, S.P., Johnson, J.W., Stanbery, B.J., Anderson, T.J., Zhang, S.B, Al-Jassim, M.M., … Materials Research Society	12 国際会議録 27-P-14 - Photocatalytic production of H2O2 over heterogenized quinone in zeolite Hwang, J.S., Lee, C.W., Chai, H.S., Park, S.-E. Elsevier

1

2

3

4

5

6

7

8

9

10

11

12