A Closer "Look" At Modern Gate Oxides
- 著者名:
Baumann, Frieder H. Chang, C.-P. Grazul, John L. Kamgar, Avid Liu, C. T. Muller, David A, - 掲載資料名:
- Gate stack and silicide issues in silicon processing : symposium held April 25-27, 2000, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 611
- 発行年:
- 2001
- 開始ページ:
- C4.1
- 出版情報:
- Warrendale, PA: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995192 [1558995196]
- 言語:
- 英語
- 請求記号:
- M23500/611
- 資料種別:
- 国際会議録
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