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Increase Of Hydrogen-Radical Density And Improvement Of The Crystalline Volume Fraction Of Microcrystalline Silicon Films Prepared By Hot-Wire Assisted PECVD Method

著者名:
Harada, H.
Inagaki, K.
Inouchi, H.
Itoh, T.
Nitta, S.
Nonomura, S.
Yamamoto, K.
Yamana, N.
Yoshida, N.
さらに 4 件
掲載資料名:
Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
609
発行年:
2001
開始ページ:
A19.3
出版情報:
Warrendale: Materials Research Society
ISSN:
02729172
ISBN:
9781558995178 [155899517X]
言語:
英語
請求記号:
M23500/609
資料種別:
国際会議録

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