Methods Of Suppressing Cluster Growth In Silane RF Discharges
- 著者名:
Koga, K. Maeda, S. Matsuoka, Y. Shiratani, M. Tanaka, K. Watanabe, Y. - 掲載資料名:
- Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 609
- 発行年:
- 2001
- 開始ページ:
- A5.6
- 出版情報:
- Warrendale: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995178 [155899517X]
- 言語:
- 英語
- 請求記号:
- M23500/609
- 資料種別:
- 国際会議録
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