Microstructural Control Of Thin Film Si Using Low Energy, High Flux Ions In Reactive Magnetron Sputter Deposition
- 著者名:
- 掲載資料名:
- Amorphous and heterogeneous silicon thin films - 2000 : symposium held April 24-28, 2000, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 609
- 発行年:
- 2001
- 開始ページ:
- A5.3
- 出版情報:
- Warrendale: Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558995178 [155899517X]
- 言語:
- 英語
- 請求記号:
- M23500/609
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
Society of Vacuum Coaters |
Materials Research Society |
Materials Research Society |
3
国際会議録
An Amorphous Silicon Thin-Film Transistor Fabricated at 125。?C by dc Reactive Magnetron Sputtering
MRS - Materials Research Society |
Materials Research Society |
Materials Research Society |
10
国際会議録
Low Temperature Deposition of High Dielectric Films Using Reactive Pulsed DC Magnetron Sputtering
Electrochemical Society |
Electrochemical Society |
Trans Tech Publications |
Materials Research Society |
MRS - Materials Research Society |