Blank Cover Image

Role of Film Hardness on the Polish Rates of Metal Thin Films

著者名:
掲載資料名:
Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
566
発行年:
2000
開始ページ:
123
終了ページ:
128
総ページ数:
6
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558994737 [1558994734]
言語:
英語
請求記号:
M23500/566
資料種別:
国際会議録

類似資料:

1 国際会議録 Mechanism of Cu Removal During CMP in H2O2-Glycine Based Slurries

Babu, S. V., Hariharaputhiran, M., Li, Y., Ramarajan, S.

Materials Research Society
7 国際会議録 The Role of Metal and Passivation Defects in Electromigration-Induced Damage in Thin Film Conductors

Lloyd, J. R., Smith, P. M., Prokop, G. S.

North-Holland
2 国際会議録 Planarization of Cu and Ta Using Silica and Alumina Abrasives--- A Comparison

Li, Y., Ramarajan, S., Hariharapluhiran, M., Her, Y.S., Babu, S.V.

Materials Research Society
8 国際会議録 The Effects of Hardness Variation on Chemical Mechanical Polishing of Copper Thin Films

Joseph Bonivel, Yusuf Williams, Sarah Blitz, Micheal Kuo, Ashok Kumar

Materials Research Society
3 国際会議録 Role of Chemicals and Abrasive Particle Properties in Chemical-Mechanical Polishing of Copper and Tantalum

Li, Y., Jindal, A., Babu, S.V.

Electrochemical Society
9 国際会議録 Hardness of Thin Films Determined Based on Nanoindentation Load and Contact Stiffness

Stone, D. S., Tambwe, M. F., Kung, H., Nastasi, M.

MRS - Materials Research Society
4 国際会議録 Modified Preston Equation―Revisited

Babu, S. RamarajanS. V.

Materials Research Society
10 国際会議録 Characterization of Chemical-Mechanical Polishing of Inter-Metal Dielectric Film

S. Morimoto, R. Breivogel, R. Gasser, S. Louke, P. Moon, R. Patterson, M. Prince

Electrochemical Society
5 国際会議録 The Influence of pH and Temperature on Polish Rates and Selectivity of Silicon Dioxide and Nitride Films

America, W. G., Babu, S. V., Srinivasan, R.

Materials Research Society
11 国際会議録 Study on Chemical-Mechanical Polishing of Low Dielectric Constant Polyimide Thin Films

Tai, Y.L., Tsai, M.S., Tung, I.C., Dai, B.T., Feng, M.S.

Electrochemical Society
6 国際会議録 Effect of pH on Chemical-Mechanical Polishing of Copper and Tantalum

Jindal, Anurag, Li, Ying, Babu, S.V.

Materials Research Society
12 国際会議録 Modeling metal thin film growth under IPVD conditions using molecular dynamics rates in a level set approach

Hansen, U., Rodgers, S., Nemirovskaya, M., Jensen, K. F.

MRS-Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12