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A Novel Retaining Ring in Advanced Polishing Head Design for Significantly Improved CMP Performance

著者名:
Bennett, D.
Bonner, B.
Garretson, C.
Huey, S.
Jin, R. R.
McKeever, P.
Osterheld, T. H.
Zuniga, S.
さらに 3 件
掲載資料名:
Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
566
発行年:
2000
開始ページ:
63
終了ページ:
72
総ページ数:
10
出版情報:
Warrendale, PA: Materials Research Society
ISSN:
02729172
ISBN:
9781558994737 [1558994734]
言語:
英語
請求記号:
M23500/566
資料種別:
国際会議録

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