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Evaluation of Copper Penetration in Low-K Polymer Dielectrics by Bias-Temperature Stress

著者名:
Kumar, D.
Loke, A. L. S.
Talwalkar, N. A.
Tanabe, T.
Townsend, P. H.
Vrtis, R. N.
Wetzel, J. T.
Wong, S. S.
Zussman, M. P.
さらに 4 件
掲載資料名:
Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
565
発行年:
1999
開始ページ:
173
終了ページ:
188
総ページ数:
16
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558994720 [1558994726]
言語:
英語
請求記号:
M23500/565
資料種別:
国際会議録

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