Blank Cover Image

Chemical and Thermal Stability of Fluorinated Amorphous Carbon Films for Interlayer Dielectric Applications

著者名:
掲載資料名:
Low-dielectric constant materials V : symposium held April 5-8, 1999, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
565
発行年:
1999
開始ページ:
117
終了ページ:
122
総ページ数:
6
出版情報:
Warrendale, Pa.: Materials Research Society
ISSN:
02729172
ISBN:
9781558994720 [1558994726]
言語:
英語
請求記号:
M23500/565
資料種別:
国際会議録

類似資料:

1 国際会議録 Study of Metal/Barrier/Low-K Interfaces for Interlayer Dielectric Applications

Chang, J.P., Case, C.B., Krautter, H.W., Sapjeta, J., Opila, R.L., Decker, M.A.

Electrochemical Society
7 国際会議録 Processing, Characterization And Reliability Of Silica Xerogel Films For Interlayer Dielectric Applications

Jain, A., Rogojevic, S., Wang, F., Gill, W.N., Wayner, Jr., P.C., Plawsky, J.L., Haberl, A., Lanford, E.

Materials Research Society
2 国際会議録 High Quality Silicon Oxide Dielectric Films By Molecular Beam Deposition

Chand, Naresh, Kola, R.R., Opila, R.L., Comizzoli, R.B., Krautter, H., Chu, S.N.G., Osenbach, J.W.

Electrochemical Society
8 国際会議録 SiLK Polymer Coating With Low-Dielectric Constant and High Thermal Stability for ULSI Interlayer Dielectric

Townsend, P. H., Martin, S. J., Godschalx, J., Romer, D. R., Smith, D. W., Jr., Castillo, D., DeVries, R., Buske, G., …

MRS - Materials Research Society
3 国際会議録 Thermal Stability of Azole Coated Copper Surfaces

Opila, R. L, Krautter, H.W., Zegarski, B.R., Dubois, L.H., Wenger, G.

Electrochemical Society
9 国際会議録 Thermal Stability of Organic Interlayer with Low Dielectric Constant

Hara, T., Takasoh, J., Yang, H., Tweet, D.J., Nguyen, T., Ma, Y., Evans, D.R., Hsu, S.T.

Electrochemical Society
4 国際会議録 FLUORINATED PARYLENE AS AN INTERLAYER DIELECTRIC FOR THIN FILM MCM"S

Dabral, S., Zhang, X., Wu, X. M., Yang, G.-R., Langm C.-I., Bakhru, H., Olson,R., Lu, T.-M., McDonald, J. F

Materials Research Society
10 国際会議録 Diamondlike Carbon Materials for the BEOL Interlayer Dielectric Applications

Grill, A., Jahnes, C., Ott, J., Patel, V., Cohln, S., Hummel, J., Mih, R., Liu, J.

Electrochemical Society
5 国際会議録 OXIDATIVE STABILITY OF TERPENES, ALTERNATIVES TO CHLOROFLUOROCARBONS FOR CLEANING ELECTRONICS

Muller, A.J., Opila, R.L., Krautter, H.W., Chandross, E.A.

Electrochemical Society
11 国際会議録 Characterization Of Fluorocarbon Deposition Of Fluorinated Amorphous Carbon Thin Films With Low Dielectric Constant And High Thermal Stability

Han, S., Bae, B.

Materials Research Society
6 国際会議録 XPS Investigation of Oxidation of Cu Seed Layers for Microelectronics Applications

Opila, R.L., Krautter, H.W., Takahashi, KM.

Electrochemical Society
12 国際会議録 Aluminum Wiring Reliability of Fluorinated Amorphous Carbon Interlayer

Iguchi, M., Matsubara, Y., Ito, S., Endo, K., Koyanagi, K., Kishimoto, K., Gomi, H., Tatsumi, T., Horiuchi, T.

MRS - Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12