Blank Cover Image

Development of Drain-Offset (DO) TFT Technology for High Density SRAMs

著者名:
Batra, S.  
掲載資料名:
Proceedings of the Second Symposium on Thin Film Transistor Technologies
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-35
発行年:
1994
開始ページ:
291
終了ページ:
310
総ページ数:
20
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770941 [1566770947]
言語:
英語
請求記号:
E23400/950720
資料種別:
国際会議録

類似資料:

1 国際会議録 Study of Polysilicon TFTs for High Density SRAM Applications

Zaman, R.J., Batra, S., Manning, M., Banerjee, S.

Electrochemical Society
7 国際会議録 Raised Source and Drain Structure of Poly-Si TFTs

He, S., Maa, J.-S.

Electrochemical Society
2 国際会議録 Analysis and modeling of submicron drain-offset polysilicon thin film transistors (TFTs)

J. Damiano, Jr., L. Jung, S.K. Banerjee, S. Batra

Society of Photo-optical Instrumentation Engineers
8 国際会議録 Performance of immersion lithography for 45-nm-node CMOS and ultra-high density SRAM with 0.25um2

S. Mimotogi, F. Uesawa, M. Tominaga, H. Fujise, K. Sho, M. Katsumata, H. Hane, A. Ikegami, S. Nagahara, T. Ema, M. …

SPIE - The International Society of Optical Engineering
3 国際会議録 A Leakage Current Model for Sub-Micron Lightly-Doped Drain-Offset Polysilicon TFTs

Jung, L., Damiano, J., Jr., Batra, S., Manning, M., Banerjee, S.K.

Electrochemical Society
9 国際会議録 POLYSILICON HIGH-VOLTAGE TFT WITH FIELD-PLATE-CONTROLLED OFFSET REGION

Huang, T. Y., Wu, I. W., Lewis, A. G., Chiang, A., Bruce, R. H.

Materials Research Society
4 国際会議録 Hydrogenated Poly-Si TFTs with a Structure of Source Overlap and Drain Offset

Jang, H.K., Lee, C.E., Noh, S.J.

Electrochemical Society
10 国際会議録 Mist Deposition for TFT Technology

K. Shanmugasundaram, S. Price, K. Chang, D. Lee, J. Ruzyllo

Electrochemical Society
5 国際会議録 The Integration of Shallow Trench Isolation (STI) for High Density DRAM with 0.18 μm Technology and Beyond

Pan, P., McQueen, M., Robinson, K., Sharan, S., Batra, S., Lane, R., Somerville, L., Tran, L.C.

Electrochemical Society
11 国際会議録 On-board SRAM signal density stress prediction [6205-28]

Hsieh S.-J., Sharma K.

SPIE - The International Society of Optical Engineering
6 国際会議録 Development of a Novel Si/Si Interconnection Technology for High Density Packaging

Khanna,P.K., Bhatnagar,S.K., Sommadossi,S., Gust,W., Mittemeijer,E J.

SPIE - The International Society for Optical Engineering
12 国際会議録 The Contribution of Atomic Steps to Reflection High energy Electron Diffraction from Semiconductor Surfaces

Pukite R. P., Cohen I. P., Batra S.

Plenum Press
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12