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Gated RF-Discharge Plasma-CVD Technology for a-Si:H TFT Fabrication

著者名:
掲載資料名:
Proceedings of the Second Symposium on Thin Film Transistor Technologies
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-35
発行年:
1994
開始ページ:
160
終了ページ:
173
総ページ数:
14
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770941 [1566770947]
言語:
英語
請求記号:
E23400/950720
資料種別:
国際会議録

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