New Applications of Ellipsometry for Materials Characterization and VLSI Device Process Control

New Applications of Ellipsometry for Materials Characterization and VLSI Device Process Control

著者名:

掲載資料名:

Proceedings of the Symposium on Diagnostic Techniques for Semiconductor Materials and Devices

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-33

発行年:

1994

開始ページ:

207

終了ページ:

216

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770927 [1566770920]

言語:

英語

請求記号:

E23400/951106

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014142
シリーズID:	PA00000028
会議名:	Symposium on Diagnostic Techniques for Semiconductor Materials and Devices ; Electrochemical Society Meeting
回次:	3rd ; 1994
会議開催地:	Miami Beach, FL, USA
会議開催年:	1994.10.10-1994.10.12

類似資料:

1 国際会議録 Recent Developments in Spectroscopic Ellipsometry for Materials and Process Control J.N. Hilfiker, B. Johs, J. Hale, C.M. Herzinger, T.E. Tiwald, C.L. Bungay, R.A. Synowicki, G.K. Pribil, J.A. Woollam Society of Vacuum Coaters	7 国際会議録 Successful application of angular scatterometry to process control in sub-100-nm DRAM device Kim, J.-, Kim, S.-J., Chin, S.-B., Oh, S.-H., Goo, D.-H., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S., Moon, J.-T., … SPIE - The International Society of Optical Engineering
2 国際会議録 Plasma Etching Endpointing by Monitoring RF Power Systems with an Artificial Neural Network Maynard, H., Rietman, E., Lee, J.T.C., Ibbotson, D. Electrochemical Society	8 国際会議録 Spin-on organic hardmask materials in 70nm devices C. Oh, D. Uh, D. Kim, J. Lee, H. Yun, I. Nam, M. Kim, K. Yoon, K. Hyung, N. Tokareva, H. Cheon, J. Kim, T. Chang SPIE - The International Society of Optical Engineering
3 国際会議録 PLASMA SURFACE INTERACTION DURING THE GROWTH OF SEMICONDUCTOR THIN FILMS STUDIED BY IN SITU INFRARED ELLIPSOMETRY Blayo, N., Drevillon, B. Materials Research Society	9 国際会議録 New liquid crystal materials enabling revolutionary display devices Kornfield, J. A., Clark, N. A., Dalton, L., Marder, S. R., Ober, C. K., Palffy-Muhoray, P., Perry, J. W., Thomas, N., … SPIE-The International Society for Optical Engineering
4 国際会議録 Application of spectroscopic ellipsometry to characterization of optical thin films (Invited Paper) Woollam, J.A., Bungay, C.L., Yan, L., Thompson, D.W., Hilfiker, J.N. SPIE-The International Society for Optical Engineering	10 国際会議録 New Developments in III-Nitride Material and Device Applications Razeghi,M., Saxler,A., Kung,P., Walker,D., Zhang,X., Kim,K.S., Vydyanath,H.R., Solomon,J., Ahoujja,M., Mitchel,W.C. Narosa Publishing House
5 国際会議録 Recent developments in spectroscopic ellipsometry for in-situ applications Johs,B.D., Hale,J., Ianno,N.J., Herzinger,C.M., Tiwald,T.E., Woollam,J.A. SPIE-The International Society for Optical Engineering	11 国際会議録 *BURIED OXIDE SOI: MATERIALS, DEVICES, AND VLSI CIRCUITS Chen, C. -E. D., Rad-Hard SOI Project Team Materials Research Society
6 国際会議録 Integration And Characterization Of Low Carbon Content SiOxCyHz Low-k Materials For < 0.18μm Dual Damascene Application Lee, J-H., Chopra, N., Ma, J., Lu, Y-C., Huang, T-F., Wilecke, R., Yau, W-F., Cheung, D., Yieh, E. Materials Research Society	12 国際会議録 Digital JTC simulator for stereo vision system Lee,J.-S., Kim,K.-T., Lee,Y.-B., Kim,E.-S. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12