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Characterization of PECVD SiNx Process and Material for TFT Gate Dielectric Applications

著者名:
掲載資料名:
Proceedings of the tenth symposium on plasma processing
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-20
発行年:
1994
開始ページ:
513
終了ページ:
524
総ページ数:
12
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770774 [1566770777]
言語:
英語
請求記号:
E23400/941901
資料種別:
国際会議録

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