Etch Induced Damage in High Density Inductively Coupled Plasma Etching Reactor

Etch Induced Damage in High Density Inductively Coupled Plasma Etching Reactor

著者名:

掲載資料名:

Proceedings of the tenth symposium on plasma processing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-20

発行年:

1994

開始ページ:

120

終了ページ:

131

総ページ数:

12

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770774 [1566770777]

言語:

英語

請求記号:

E23400/941901

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014129
シリーズID:	PA00000028
会議名:	International Symposium on Plasma Processing ; Meeting of the Electrochemical Society
回次:	10th ; 185th
会議開催地:	San Francisco, CA, USA
会議開催年:	1994.05.22-1994.05.27

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