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Point Defect Structure And Behavior As A Function Of Processing Parameters And P.M. Lenahan Composition In Silicon Oxynitride Films

著者名:
掲載資料名:
Proceedings of the third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-16
発行年:
1994
開始ページ:
73
終了ページ:
82
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770484 [1566770483]
言語:
英語
請求記号:
E23400/942240
資料種別:
国際会議録

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