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CHARACTERIZATION OF THIN-FILM BESOI USING A CVD Si1x-y-Gex-By ETCH STOP

著者名:
掲載資料名:
Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-10
発行年:
1994
開始ページ:
432
終了ページ:
442
総ページ数:
11
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770422 [1566770424]
言語:
英語
請求記号:
E23400/941387
資料種別:
国際会議録

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