SILICON FLOATING ZONE PROCESS: NUMERICAL MODELLING OF RF FIELD, HEAT TRANSFER, THERMAL STRESS AND EXPERIMENTAL PROOF FOR 4' CRYSTALS
- 著者名:
Riemann, H. Luedge, A. Boettcher, K. Rost, H-J. Hallmann, B. Schroeder, W. Hensel, W. Schleusener, B. - 掲載資料名:
- Proceedings of the Seventh International Symposium on Silicon Materials Science and Technology
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1994-10
- 発行年:
- 1994
- 開始ページ:
- 111
- 終了ページ:
- 123
- 総ページ数:
- 13
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770422 [1566770424]
- 言語:
- 英語
- 請求記号:
- E23400/941387
- 資料種別:
- 国際会議録
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