Blank Cover Image

*FACTORS AFFECTING CHARGING DAMAGE DURING PLASMA ETCHING

著者名:
McVittie, J.P.  
掲載資料名:
Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1994-9
発行年:
1994
開始ページ:
59
終了ページ:
70
総ページ数:
12
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770415 [1566770416]
言語:
英語
請求記号:
E23400/941386
資料種別:
国際会議録

類似資料:

1 国際会議録 Modeling of Notching Caused by Aspect Ratio Dependent Charging During High Density Plasma Etching

Hane, M., Kinoshita, T., McVittie, J.P.

Electrochemical Society
7 国際会議録 THE ROLE OF * ANTENNA * STRUCTURE ON THIN OXIDE DAMAGE FROM PLASMA INDUCED WAFER CHARGING

Fang, Sychyi, McVittie, James P.

Materials Research Society
2 国際会議録 CHARGING EFFECTS ON ION TRAJECTORIES IN PLASMA ETCHING

Murakawa, S., Fang, S., McVittie, J.P.

Electrochemical Society
8 国際会議録 KINETIC MODELING AND MEASUREMENT OF ACTIVE SPECIES DISTRIBUTIONS DURING DRY ETCHING

Uhm, K.S., Kump, M.R., McVittie J.P., Dutton, R.W.

Materials Research Society
3 国際会議録 Characterization of Damage Reduction Effect from Dielectric Protective Layer by a Real-Time Plasma Charging Probe

Ma, S., McVittie, J.P.

Electrochemical Society
9 国際会議録 A New Probe for Direct Measurement of Surface Charging

McVittie, J.P., Murakawa, S.

Electrochemical Society
4 国際会議録 Effect of Exposed Gate Oxide Edge on the Plasma Induced Damage After Charging been Eliminated

Ma, S., McVittie, J.P.

Electrochemical Society
10 国際会議録 Modeling of Aspect Ratio Dependent Etching in an Inductively Coupled Plasma

Han, J. S., Mcvittie, J. P.

MRS - Materials Research Society
5 国際会議録 The Effect of Ion Heating on the Angular Distributions in Plasma Etching Processes

Zheng, J., McVittie, J.P.

Electrochemical Society
11 国際会議録 Limitations of Plasma Charging Damage Measurements Using MOS Capacitor Structures

Ma, Shawming, Abdel-Ati, Wael L. N., McVittie, James P.

MRS - Materials Research Society
6 国際会議録 Comparison of Automated Capacitor Testing Methods for Plasma Charging Induced Damage

Abdel-Ati, W.L.N., Ma, S., Yang, T.-C., McVittie, J.P., Saraswat, K.C.

Electrochemical Society
12 国際会議録 Characterization of Plasma Surface Charging Using a Real- Time On-Wafer Probe

Ma, S., McVittie, J.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12