SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING

SILICON SURFACES EXPOSED TO ANHYDROUS HF/CH3OH ETCHING

著者名:

掲載資料名:

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-7

発行年:

1994

開始ページ:

384

終了ページ:

391

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770385 [1566770386]

言語:

英語

請求記号:

E23400/941397

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014117
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Electrochemical Society Fall Meeting
回次:	3rd ; 1993
会議開催地:	New Orleans, Louisiana, USA
会議開催年:	1993.10.15-1993.10.20

類似資料:

1 国際会議録 EVOLUTION OF Si SURFACES AFTER ANHYDROUS HF:CH3OH ETCHING Torek, K., Miechkowski, A., Ruzyllo, J. Electrochemical Society	7 国際会議録 Silicon surface micromachining by anhydrous HF gas-phase etching with methanol Jang,W.I., Choi,C.A., Lee,C.S., Hong,Y.S., Lee,J.H., Baek,J.T., Kim,B.W. SPIE-The International Society for Optical Engineering
2 国際会議録 Monitoring of HF/H2O Treated Silicon Surfaces Using Non-Contact Surface Charge Measurements Roman, P., Hwang, D., Torek, K., Ruzyllo, J., Kamieniecki, E. MRS - Materials Research Society	8 国際会議録 Gas Phase Conditioning of Silicon Surface after Reactive Ion Etching Hwang, D.K., Ruzyllo, J. Electrochemical Society
3 国際会議録 REMOVAL OF Al FROM SILICON SURFACES USING UV/Cl2 Daffron, C., Torek, K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	9 国際会議録 Feasibility of surface photovoltage based characterization of ultra-thin SOI wafers Lukasiak, L., Kamieniecki, E., Jakubowski, A., Ruzyllo, J. Electrochemical Society
4 国際会議録 CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	10 国際会議録 LOW-TEMPERATURE ATMOSPHERIC AMBIENT RAPID LAMP CLEANING OF SILICON SURFACES Roman, P., Tsai, C.-L., Hengstebeck, R., Pantano, C., Berry, J., Kamieniecki, E., Ruzyllo, J. Electrochemical Society
5 国際会議録 Anhydrous HF Processing as an Alternative to HF/Water Processes Staffa, J., Roman, P., Chang, K., Torek, K., Ruzyllo, J. MRS - Materials Research Society	11 国際会議録 GAS-PHASE ETCHING OF SILICON OXiDE WITH ANHYDROUS HF AND ISOPROPANOL Butterbaugh, J.W., Hiatt, C.F., Gray, D.C. Electrochemical Society
6 国際会議録 MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING Hwang, D.K., Ruzyllo, J., Kamieniecki, E. Electrochemical Society	12 国際会議録 Semiconductor Surface Cleaning and Conditioning Challenges Beyond Planar Silicon Technology J. Ruzyllo Electrochemical Society

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