ECR OXYGEN PLASMA CLEANING OF OXIDE ETCHED SURFACES

ECR OXYGEN PLASMA CLEANING OF OXIDE ETCHED SURFACES

著者名:

掲載資料名:

Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-7

発行年:

1994

開始ページ:

319

終了ページ:

328

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770385 [1566770386]

言語:

英語

請求記号:

E23400/941397

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014117
シリーズID:	PA00000028
会議名:	International Symposium on Cleaning Technology in Semiconductor Device Manufacturing ; Electrochemical Society Fall Meeting
回次:	3rd ; 1993
会議開催地:	New Orleans, Louisiana, USA
会議開催年:	1993.10.15-1993.10.20

類似資料:

1 国際会議録 COMPARISON OF IN SITU, ISOTROPIC DOWNSTREAM, AND INDUCTIVELY COUPLED PLASMA DOWNSTREAM POST-CONTACT ETCH CLEANING Mikulan, P.I., Koo, T.T., Fonash, S.J., Reinhardt, K.A. Electrochemical Society	7 国際会議録 OXIDE DEGRADATION RESULTING FROM PHOTORESIST ASHING Mikulan, P. I., Koo, T. T., Awadelkarim, O. O., Fonash, S. J., Ta, T., Chan, Y. D. MRS - Materials Research Society
2 国際会議録 Damage Resulting from Polysilicon Gate Etching: Effect of Electrode Age and Sequencing within a Cassette Mikulan, P.I., Awadelkarim, O.O., Fonash, S.J., Reinhardt, K.A., Rembetski, J.F. Electrochemical Society	8 国際会議録 DRY SURFACE CLEANING OF PLASMA-ETCHED HEMTs Pearton, S.J., Ren, F., Katz, A., Chakrabarti, U.K., Lane, E., Hobson, W.S., Kopf, R.F., Abernathy, C.R., Wu, C.S., … Materials Research Society
3 国際会議録 *SURFACE CONDITIONING ISSUES RELATED TO PATTERNING AND ETCHING Fonash, S.J., Ditizio, R.A., Gu, T., Mikulan, P.I., Awadelkarim, O.O., Collins, R.W., Rembetski, J.F., Reinhardt, K.A., … Materials Research Society	9 国際会議録 Low Temperature Polycrystalline Silicon Thin Films Deposited by ECR Plasma Kalkan, A.K., Bae, S., Farber, D.G., Fonash, S.J. Electrochemical Society
4 国際会議録 Electrical Characterization of Damage Phenomena Induced in Silicon by Magnetically-Enhanced Reactive Ion Etching Awadelkarim, O.O., Gu, T., Mikulan, P.I., Fonash, S.J., Reinhardt, K., Chan, Y.D. Electrochemical Society	10 国際会議録 Effects of Oxide Etching on Silicon Substrate Quality Reinhardt, K., White, A., Marks, J., DiVincenzo, B., Gu, T., Fonash, S. Electrochemical Society
5 国際会議録 AN EFFECTIVE IN-SITU O2 HIGH DENSITY PLASMA CLEAN Reinhardt, K., Divincenzo, B., Yang, C.-L., Arleo, P., Marks, J., Mikulan, P., Gu, T., Fonash, S. MRS - Materials Research Society	11 国際会議録 Use of beam profile reflectometry to determine depth of silicon etch damage and contamination Reinhardt,K.A., Kelso,S.M. SPIE-The International Society for Optical Engineering
6 国際会議録 An Assessment of Damage Resulting from Resist Stripping Mikulan, P.I., Koo, T.T., Awadelkarim, O.O., Fonash, S.J., Ta, T., Chan, Y.D. Electrochemical Society	12 国際会議録 Silicon micromachining and its impact on materials and device properties: plasma etching damage issues O.O. Awadelkarim, T. Gu, S.J. Fonash Society of Photo-optical Instrumentation Engineers

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