Comparison of Wafer Cassette Contamination Using Multi-Techniques

Comparison of Wafer Cassette Contamination Using Multi-Techniques

著者名:

掲載資料名:

Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing II

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

1994-3

発行年:

1994

開始ページ:

132

終了ページ:

142

総ページ数:

11

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566770651 [1566770653]

言語:

英語

請求記号:

E23400/941395

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014113
シリーズID:	PA00000028
会議名:	Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing ; Electrochemical Spring Meeting
回次:	2nd ; 1993
会議開催地:	Honolulu, Hawaii, USA
会議開催年:	1993.05.16-1993.05.22

類似資料:

1 国際会議録 ANOMALOUS IRON AND CHROMIUM CONTAMINATION FROM BOE Hockett, R.S., Metz, J.M., Ritterbush, L., Torry, P., Corrado, J. Electrochemical Society	7 国際会議録 TXRF CHARACTERIZATION OF TRACE METAL CONTAMINATION IN THIN GATE OXIDES . Hockett, R.S., Hymes, Diane Materials Research Society
2 国際会議録 SURFACE METAL CONTAMINATION ON SILICON WAFERS MEASURED BY SurfaceSIMS Smith, Stephen P., Hitzman, C.J., Hockett, R.S. Electrochemical Society	8 国際会議録 SURFACE SIMS ROUND ROBIN FOR NA, AL AND K ON SILICON WAFERS Hockett, R.S., Diebold, Alain Electrochemical Society
3 国際会議録 SIMS Study of C, O and N Impurity Contamination for Multi-Crystalline Si Solar Cells Larry Wang, R.S. Hockett Materials Research Society	9 国際会議録 HIGH SENSITIVITY SURFACE ANALYSIS OF SILICON WAFERS BY TIME-OF FLIGHT SECONDARY ION MASS SPECTROMETRY (TOF-SIMS) Schueler, B., Hockett, R.S. Electrochemical Society
4 国際会議録 EXPLORATORY USE OF MICRO-XANES FOR PARTICLE DETECTION AND ANALYSIS ON SI WAFERS Brundle, C.R., Uritsky, Y., Warwick, A., Hockett, R.S., Craig, A., Ayre, C. Electrochemical Society	10 国際会議録 Temporal pulse shaping using fiber laser technology: nanoscaling for flexible industrial laser material processing Patel, R.S., Stock, M.L., Sartania, Z., Bovatsek, J.M., Arai, A.Y., Endert, H. SPIE-The International Society for Optical Engineering
5 国際会議録 CHARACTERIZATION OF HEAVY METAL CONTAMINATION IN DIAMOND FILMS USING MIMS, TXRF, AND RBS Hockett, R.S., Knowles, James Materials Research Society	11 国際会議録 TXRF REFERENCE STANDARDS: A DISCUSSION Hockett, R.S. Electrochemical Society
6 国際会議録 SIMS measurements of metal contamination in SOI Hong Yang, M., Wang, A., Neuburger, M., Hockett, R.S. Electrochemical Society	12 国際会議録 THE CORRELATION BETWEEN QUANTITATIVE SURFACE METALLIC CONTAMINATION AND RTP-INDUCED SURFACE DEFECTS Hockett, R. S. Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12