Blank Cover Image

MODELING OF PROFILE EVOLUTION IN DIAMOND CVD

著者名:
掲載資料名:
Proceedings of the Third International Symposium on Diamond Materials
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1993-17
発行年:
1993
開始ページ:
276
終了ページ:
282
総ページ数:
7
出版情報:
Pennington, N.J.: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770606 [1566770602]
言語:
英語
請求記号:
E23400/932032
資料種別:
国際会議録

類似資料:

1 国際会議録 PROFILE MODELING OF PHYSICAL VAPOR DEPOSITIN OF Ti AND Wsi

Eguchi, Y., IslamRaja, M.M., McVittie, J.P., Saraswat, K.C.

Electrochemical Society
7 国際会議録 CVD TiN process Modeling for Contact/Via Barriers

Paranjpe, A., IslamRaja, M.

Electrochemical Society
2 国際会議録 Profile Modeling of Collimated Ti Physical Vapor Deposition

Bang, D., McVittie, J.P., IslamRaja, M.M., Saraswat, K. C., Krivokapic, Z., Ramaswami, S., Cheung, R.

Electrochemical Society
8 国際会議録 Development of CVD Diamond Radiation Detectors

Adam, W., Bauer, C., Berdermann, E., Bogani, F., Borchi, E., Bruzzi, M., Colledani, C., Conway, J., Dabrowski, W., …

Electrochemical Society
3 国際会議録 Profile Simulation Studies Of Oxide Deposition From Ozone/TEOS

Li, J., McVittie, J.P., Ferziger, J., Saraswat, K.C., Schmidt, M., Dobkin, D.

Electrochemical Society
9 国際会議録 Characterization of Damage Reduction Effect from Dielectric Protective Layer by a Real-Time Plasma Charging Probe

Ma, S., McVittie, J.P.

Electrochemical Society
4 国際会議録 Comparison of Automated Capacitor Testing Methods for Plasma Charging Induced Damage

Abdel-Ati, W.L.N., Ma, S., Yang, T.-C., McVittie, J.P., Saraswat, K.C.

Electrochemical Society
10 国際会議録 Effect of Exposed Gate Oxide Edge on the Plasma Induced Damage After Charging been Eliminated

Ma, S., McVittie, J.P.

Electrochemical Society
5 国際会議録 ATOMIC HYDROGEN RECOMBINATION ON CVD DIAMOND

Proudfit, J.A., Cappelli, M.A.

Electrochemical Society
11 国際会議録 KINETIC MODELING AND MEASUREMENT OF ACTIVE SPECIES DISTRIBUTIONS DURING DRY ETCHING

Uhm, K.S., Kump, M.R., McVittie J.P., Dutton, R.W.

Materials Research Society
6 国際会議録 Simulation Studies of TiN PVD and CVD Thin Films for Contact/Via Liners

Bang, D. S., Mcvittie, J. P., Saraswat, K. C., Iacoponi, J. A., Gray, J., Krivokapic, Z., Littau, K. A.

MRS - Materials Research Society
12 国際会議録 EFFECTS OF FLAME SPEED AND STOICHIOMETRY ON LOW PRESSURE COMBUSTION DIAMOND GROWTH

Kim, J., Cappelli, M.A.

Electrochemical Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12