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The Influence of HF, 0H, and Dissolved 02 on Silicon Surface Chemical Cleaning

著者名:
Higashi, G.S.
Chabal, Y.J.
Raghavachari, K.
Becker, R.S.
Green, M.P.
Hanson, K.
Boone, T.
Eisenberg, J.H.
Shive, S.F.
DiBello, G.N.
Fulford, K.L.
さらに 6 件
掲載資料名:
Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1993-13
発行年:
1993
開始ページ:
189
終了ページ:
198
総ページ数:
10
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770637 [1566770637]
言語:
英語
請求記号:
E23400/932028
資料種別:
国際会議録

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