Blank Cover Image

Ultra Shallow Junctions: Formation, Characterization, and Modeling

著者名:
Osburn, C.M.
Chevacharoenkul, S.
Wang, Q.F.
Tsai, J.Y.
Cowen, A.
Rose, J.
Zhang, X.
Kellam, M.
さらに 3 件
掲載資料名:
Proceedings of the fourth International Symposium on Ultra Large Scale Integration Science and Technology : ULSI science and technology/1993
シリーズ名:
Electrochemical Society Proceedings Series
シリーズ巻号:
1993-13
発行年:
1993
開始ページ:
146
終了ページ:
157
総ページ数:
12
出版情報:
Pennington, NJ: Electrochemical Society
ISSN:
01616374
ISBN:
9781566770637 [1566770637]
言語:
英語
請求記号:
E23400/932028
資料種別:
国際会議録

類似資料:

1 国際会議録 PREDICT1.6: MODELING OF METAL SILICIDE PROCESSES

Osburn, C.M., Tsai, J.Y., Wang, Q.F., Rose, J., Cowen, A.

Electrochemical Society
7 国際会議録 Thickness Effect On Nickel Silicide Formation And Thermal Stability For Ultra Shallow Junction CMOS

Zhao, F.F., Shen, Z.X., Zheng, J.Z., Gao, W.Z., Osipowicz, T., Pang, C.H., Lee, P.S., See, A.K.

Materials Research Society
2 国際会議録 RTP for Advanced Device Fabrication using Shallow, Elevated, and Silicided Junctions

Osburn, C.M.

Electrochemical Society
8 国際会議録 Laser Annealing for Ultra-Shallow Junction Formation in Advanced CMOS

Surdeanu, R., Ponomarev, Y.V., Cerutti, R., Pawlak, B.J., Nanver, L.K., Hoflijk, I., Stolk, P.A., Dachs, C.J.J., …

Electrochemical Society
3 国際会議録 SILICON CONSUMPTION DURING SELF-ALIGNED TITANIUM SILICIDE FORMATION ON SHALLOW JUNCTIONS

Smith, P.L., Osburn, C.M., Wen, D.S., McGuire, G.

Materials Research Society
9 国際会議録 Shallow Junction Formation by Small Cluster Implantation

Lu, X., Shao, L., Wang, X., Chen, Q., Liu, J., Chu, W.K., Bennett, J., Larson, L.

Electrochemical Society
4 国際会議録 Transient relaxation of optical transmissivity of composite thin films with different nanoscale Ag particles

Wu,J.L., Wang,C.M., Zhang,Q.F., Xu,B.X., Zou,Y.H.

SPIE-The International Society for Optical Engineering
10 国際会議録 Preparation of Titanium Microfiltration Membrane by Field-Flow Fractionation Deposition

Q.B. Wang, H.P. Tang, Q.C. Zhang, Q.F. Qiu, J.Y. Wang

Trans Tech Publications
5 国際会議録 17 Laser thermal processing for ultra-shallow junction formation: experiment and modelling

Venturini, J., Hernandez, M, Sarnet, T., Kerrien, G., Laviron, C., Santailler, J.L., Boulmer, J.

Electrochemical Society
11 国際会議録 Ultra-Shallow Junction Formation Via Thermal diffusion of Boron into High Energy Ion Irradiated Silicon

Shao, L., Lu, X.M., Wang, X.M., Liu, J.R., Chu, W.K.

Electrochemical Society
6 国際会議録 Drain Engineering of Sub-Quarter-μm MOSFET Devices

Tsai, J.-Y., Osburn, C.M.

Electrochemical Society
12 国際会議録 Demonstration of the State-of-the-Art of Formation and Characterization of Ultra-Shallow Junctions

Borden, P., Al-Bayati, A., Madsen, J., Lazik, C., Carey, P., Bechtler, L., Mayur, A.

Materials Research Society
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12