Si Atom Density Profiles In a Rotating Disk CVD Reactor
- 著者名:
- 掲載資料名:
- Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 1993-2
- 発行年:
- 1993
- 開始ページ:
- 8
- 終了ページ:
- 12
- 総ページ数:
- 5
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566770743 [1566770742]
- 言語:
- 英語
- 請求記号:
- E23400/930161
- 資料種別:
- 国際会議録
類似資料:
American Institute of Chemical Engineers | |
North-Holland |
Electrochemical Society |
MRS - Materials Research Society |
MRS - Materials Research Society |
Electrochemical Society |
Electrochemical Society |
American Institute of Chemical Engineers |
Materials Research Society |
American Institute of Chemical Engineers |
12
国際会議録
A Two-Dimensional Numerical Model of Gas Mixing and Deposition in a Rotating Disk CVD Reactor
Electrochemical Society |