Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
- 著者名:
Kraus, P.A. Chua, T.C. Rothschild, A. Cubaynes, F.N Veloso, A. Mertens, S. Date, L. Baue, T.M. Ahmed, K.Z. Campbell, J. Noun, F. Cruse, J. Schreutelkamp, R. Schaekers, M. - 掲載資料名:
- Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium
- シリーズ名:
- Electrochemical Society Proceedings Series
- シリーズ巻号:
- 2004-01
- 発行年:
- 2004
- 開始ページ:
- 236
- 終了ページ:
- 243
- 総ページ数:
- 8
- 出版情報:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774062 [1566774063]
- 言語:
- 英語
- 請求記号:
- E23400/200401
- 資料種別:
- 国際会議録
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