Fundamental Issues in Millisecond Annealing

Fundamental Issues in Millisecond Annealing

著者名:

掲載資料名:

Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2004-01

発行年:

2004

開始ページ:

11

終了ページ:

18

総ページ数:

8

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774062 [1566774063]

言語:

英語

請求記号:

E23400/200401

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014089
シリーズID:	PA00000028
会議名:	International symposium an advanced short-time thermal processing for Si-based CMOS devices ; Meeting of the Electrochemical Socity
回次:	2nd ; 205th
会議開催地:	San Antonio, TX, USA
会議開催年:	2004.05.10-2004.05.12

類似資料:

1 国際会議録 Low-Temperature Measurements and Monitors for Rapid Thermal Processing Timans, P.J., Acharya, N., Amarilic, I. Electrochemical Society	7 国際会議録 REGROWTH RATES OF AMORPHOUS LAYERS IN SILICON-ON- SAPPHIRE FILMS Timans, P.J., McMahon, R.A., Ahmed, H. Materials Research Society
2 国際会議録 The Effect of Chamber Components on Wafer Temperature Response in an RTP System Acharya, N., Timans, P. J. MRS - Materials Research Society	8 国際会議録 Emissivity-Independent Rapid Thermal Processing Using Radiation Shields Timans, P. J., Morishige, R. N., Wasserman, Y. MRS - Materials Research Society
3 国際会議録 A Short History of Pattern Effects in Thermal Processing P.J. Timans Trans Tech Publications	9 国際会議録 The Role of Thermal Radiative Properties of Semiconductor Wafers in Rapid Thermal Processing Timans, P. J. MRS - Materials Research Society
4 国際会議録 Millisecond Annealing: Past, Present and Future Paul Timans, Jeff Gelpey, Steve McCoy, Wilfried Lerch, Silke Paul Materials Research Society	10 国際会議録 The thermal radiative properties of semiconductors Timans J. P. Kluwer Academic Publishers
5 国際会議録 TIME RESOLVED REFLECTIVITY MEASUREMENTS APPLIED TO RAPID ISOTHERMAL ANNEALING OF ION IMPLANTED SILICON Timans, P. J., McMahon, R. A., Ahmed, H. Materials Research Society	11 国際会議録 Reflectance and Transmittance Measurements in a Mock-Up Rapid Thermal Processing Chamber Shen, Y.J., Zhu, Q.Z., Zhang., Z.M., Timans, P.J. Electrochemical Society
6 国際会議録 KINETICS AND MICROSTRUCTURE OF TRANSIENTLY ANNEALED IMPLANTED POLYCRYSTALLINE SILICON LAYERS England, J.M.C., Timans, P.J., McMahon, R.A., Ahmed, H., Hill, C., Augustus, P.D., Boys, D.R. Materials Research Society	12 国際会議録 TuB1:DVD copy protection issues:technology,consensus,and implementation. Wehrenberg,P.J. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12