Anodic Dissolution of Cobalt in Ammoniacal Ammonium Carbonate Solution

Anodic Dissolution of Cobalt in Ammoniacal Ammonium Carbonate Solution

著者名:

掲載資料名:

Electrochemistry in mineral and metal processing : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-18

発行年:

2003

開始ページ:

204

終了ページ:

204

総ページ数:

1

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566774017 [1566774012]

言語:

英語

請求記号:

E23400/200318

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014081
シリーズID:	PA00000028
会議名:	International Symposium on Electrochemistry in Mineral and Metal Processing ; Meeting of the Electrochemical Society
回次:	6th ; 203rd
会議開催地:	Paris, France
会議開催年:	2003.05.14-2003.05.18

類似資料:

1 国際会議録 Electrodeposition of Iron in Aqueous Ferrous Sulfate Solution: Role of Ammonium Ion K. Osseo-Asare, M. Deelo, K. Weil Electrochemical Society	7 国際会議録 Colloids and Surfaces in Chemical Mechanical Polishing: An Adsorptive Model for Abrasive Particle/Oxide Substrate Interactions Osseo-Asare, K. Electrochemical Society
2 国際会議録 Mechanism of Sulfonate Adsorption at the Silver Iodide-Solution Interface Osseo-Asare, K., Fuerstenau, D. W., Ottewill, R. H. American Chemical Society	8 国際会議録 Kinetics of the Formation of Cu(I)BTA Films Al-Hinai, A., Osseo-Asare, K. Electrochemical Society
3 国際会議録 Oxidation and Dissolution Characteristics of Tungsten: Application To Chemical Mechanical Polishing Anik, M., Osseo-Asare, K. Electrochemical Society	9 国際会議録 Estimation of W Polishing Characteristics During W-CMP with Iodate-Based Slurries Anik, M., Osseo-Asare, K. Electrochemical Society
4 国際会議録 Synthesis of dimethyl carbonate by transesterification of ethylene carbonate and methanol using quaternary ammonium salt catalysts D.W. Park, E.S. Jeong, K.H. Kim, K.V. Bineesh, J.W. Lee, S.W. Park Elsevier	10 国際会議録 Tungsten CMP: Reduction Behavior of Iodate Ion on Tungsten Anik, M., Osseo-Asare, K. Electrochemical Society
5 国際会議録 Chemical-Mechanical Polishing of Metals: the Role of Metal Concentration Gradient Osseo-Asare, K. Electrochemical Society	11 国際会議録 Concentration Gradient Effects in Tungsten Chemical Mechanical Polishing Anik, M., Osseo-Asare, K. Electrochemical Society
6 国際会議録 Chemical-Mechanical Polishing of Tungsten: An Electrophoretic Mobility Investigation of Alumina-Tungstate Interactions Osseo-Asare, K., Khan, A. Electrochemical Society	12 国際会議録 Aqueous Slurries in Chemical Mechanical Polishing: Adsorption of Silicate Ions by Ceria Osseo-Asare, K., Suphantharida, P. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12