Orientation-Dependent Anisotropic Etching Simulation in Silicon Wafer

Orientation-Dependent Anisotropic Etching Simulation in Silicon Wafer

著者名:

掲載資料名:

Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-9

発行年:

2003

開始ページ:

389

終了ページ:

397

総ページ数:

9

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773898 [156677389X]

言語:

英語

請求記号:

E23400/200309

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014073
シリーズID:	PA00000028
会議名:	SBMICRO
回次:	18th (2003)
会議開催地:	Sao Paulo, Brazil
会議開催年:	2003.09.08-2003.09.11

類似資料:

1 国際会議録 Wet Anisotropic Etching Characterization of Crystalline Silicon for Suspended Micro- Mechanical Structure Manufacture Neli, R.R., Doi, I., Diniz, J.A., Swan, J.W. Electrochemical Society	7 国際会議録 Process Optimization for Microbolometers Fabrication Neli, R. R., Doi, I., Diniz, J. A. Electrochemical Society
2 国際会議録 Suspended Membranes Made by Silicon Nitride Deposited by ECR-CVD Biasotto, C., Monte, B., Neli, R. R., Ramos, A. C. S., Diniz, J. A., Moshkalyov, S.A., Doi, I., Swart, J. W. Electrochemical Society	8 国際会議録 The Effect of Nitrogen Concentration at Silicon Oxynitride Gate Insulators Formed by 28N2+ Implantation into Silicon with Additional Conventional or Rapid … Felicio, A.G., Diniz, J.A., Godoy Fo., J., Doi, I., Pudeozi, M.A.A., Swart, J.W. Electrochemical Society
3 国際会議録 Silicon nitride deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposititon for micromachining applications Panepucci,R.R., Diniz,J.A., Carli,E., Tatschi,P.J., Swart,J.W. SPIE-The International Society for Optical Engineering	9 国際会議録 Selective Etching of Polycrystalline Silicon in a Hexode Type Plasma Etcher Vieira, R., Martarello, V., Moshkalyov, S. A., Diniz, J. A., Swart, J. W. Electrochemical Society
4 国際会議録 Ultra-Thin Silicon Oxynitride Gate-Dielectric Made by ECR Plasmas Manera, G.A., Diniz, J.A., Doi, I., Swart, J.W. Electrochemical Society	10 国際会議録 Simulation and Fabrication of Suspended-Membrane Resistive Microbolometers Using Gold-Black as Absorber F.L. Della Lucia, J.W. Swart, L.B. Zoccal, J.A. Diniz, I. Doi Electrochemical Society
5 国際会議録 A Comparative Study of Aluminum and Tungsten Silicon Schottky Diodes de Souza, P.R., Swart, J.W., Diniz, J.A. Electrochemical Society	11 国際会議録 Modeling and Simulation of Static Characteristics of a pMOS Coinpatihie Hot Wire Principle- Based Flow Micro-sensor Junior, A.C.O., Doi, I., Diniz, J.A., Swart, J.W., Simocs, E.W. Electrochemical Society
6 国際会議録 Un-cooled Thermal Infrared Detector for Detection of Far-Infrared Radiation Neli, R. R., Doi, I., Melo, A. M., Arbex, C. J. N., Zakia, M. B. P., Kaufmann, P., Diniz, J. A., Swart, J. W. Electrochemical Society	12 国際会議録 Deep Anisotropic Etching of Silicon with Smooth Surface for Micromachining Applications Moshkalyov, S.A., Reyes-Betanzo, C., Swart, J.W. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12