Effects of C2H2 Gas Content on the Characteristics of DLC Films Deposited by Magnetron Sputtering

Effects of C2H2 Gas Content on the Characteristics of DLC Films Deposited by Magnetron Sputtering

著者名:

Libardi, J.

掲載資料名:

Microelectronics technology and devices : SBMICRO 2003 : proceedings of the eighteenth international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-9

発行年:

2003

開始ページ:

349

終了ページ:

356

総ページ数:

8

出版情報:

Pennington, N.J.: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773898 [156677389X]

言語:

英語

請求記号:

E23400/200309

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014073
シリーズID:	PA00000028
会議名:	SBMICRO
回次:	18th (2003)
会議開催地:	Sao Paulo, Brazil
会議開催年:	2003.09.08-2003.09.11

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