Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO2, and SnO2

Balancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions of ZrO, HfO2, and SnO2

著者名:

掲載資料名:

Chemical vapor deposition XVI and EUROCVD 14 : proceedings of the international symposium

シリーズ名:

Electrochemical Society Proceedings Series

シリーズ巻号:

2003-8

発行年:

2003

開始ページ:

829

終了ページ:

838

総ページ数:

10

出版情報:

Pennington, NJ: Electrochemical Society

ISSN:

01616374

ISBN:

9781566773782 [1566773784]

言語:

英語

請求記号:

E23400/200308

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00014072
シリーズID:	PA00000028
会議名:	International Conference on Chemical Vapor Deposition ; EUROCVD ; Electrochemical Society Meeting
回次:	16th ; 14th ; 203rd
会議開催地:	Paris, France
会議開催年:	2003.04.27-2003.05.02

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